Advanced Material Machinery

FCCL Plazma Treatment Machine

FCCL 플라즈마 처리기

The FCCL plasma treatment machine improves the adhesion of the PI layer by irradiating its surface with a plasma gas beam. After plasma treatment, the material can be effectively used in edge slitting and inspection processes, and it also facilitates the removal of organic contaminants from the PI surface.

Specifications
구분 사양
Base Material
Copper foil (rolled and electrolytic), PI film, FCCL
Material Thickness
FCCL: 24–60 µm Copper Foil: 12–35 µm PI Film: 12–25 µm
Web Width
Max. 540 mm
Roll Width
650 mm
Machine Speed
10 m/min
Slitting Width
Max. 520 mm